X-rays in Semiconductor
Sigray’s x-ray solutions include 3D x-ray microscopes and microXRF systems in vacuum environments. These systems are used for a range of semiconductor applications, including everything from inspection of wafer contamination and silicon-side process monitoring to failure analysis of packaging.
Packaging Failure Analysis at Highest Resolution
The ever-shrinking dimensions of advanced packaging necessitates ultrahigh resolution in large, intact packages. Sigray produces two systems: Apex XCT-150 (ultrahigh throughput) and EclipseXRM-900 (ultrahigh resolution) for semiconductor needs in failure analysis.
Both represent a step change from existing 3D x-ray microscopes (XRMs) which have become a workhorse for semiconductor FA, but have been limited by their reliance on two-stage magnification geometries that necessitate the use of inefficient, ultrathin scintillators.
X-rays for Circuit Debugging (X-ray Assisted Device Alteration)
Backside power delivery (BPD) is widely anticipated by the semiconductor industry to be a pivotal development, enabling more efficient power delivery due to reduced resistance and significant improvements to transistor density (20-30% cell area reduction). The challenge with BPD is that existing circuit debugging / marginal fault isolation techniques such as LADA (laser assisted device alteration) will become obsolete.
Sigray has developed a new technique called X-ray Assisted Device Alteration (XADA). The Sigray XADA-200 provides microns-scale probing of intact devices under test (DUT) to isolate critical speed paths. Its introduction won the Outstanding Paper of the Year at ISTFA 2022, co-published with Dr. William Lo at NVIDIA.
Reverse Engineering & Trusted Circuit
Sigray’s Apex XCT-150 provides 0.5 um resolution 3D imaging of large PCBs and packages within minutes for reverse engineering and trusted circuit applications. Complete montages of intact packages of 200 cm x 200 cm are possible at spatial resolutions down to 0.5 um.
Wafer Level Packaging
Apex XCT-150 enables intact wafer imaging for next-generation packaging schemes. The system is successfully used for submicron failures such as voids, non-wets, cracks, etc. in TSVs, hybrid microbumps, and solder.
Front-end-of-the-line (FEOL) Process Monitoring
Sigray’s AttoMap XRF has been adopted by leading semiconductor companies for inspection of FEOL processes due to its accurate quantification and small spot sizes of 3-20 µm, allowing focusing of the beam completely within a 40 µm test pattern. The high sensitivity of the AttoMap enables quantitative analysis of trace levels of dopants and has demonstrated down to sub-Angstrom equivalent thickness.
Organic Contaminants and Trace Low-Z Elements
There is a general misperception that quantification of low atomic number (Z) elements such as B, C, O, and N at minor to trace levels is not achievable with microXRF at high resolutions. AttoMap-310 features a high vacuum chamber and a patented Si-based x-ray source that provides optimal illumination for low atomic number elements. Information on B doping and organic contamination can be achieved at excellent resolution (10-100 µm).