Patents on Sigray Products

Apex

11/686,692 (US) – High throughput 3D x-ray imaging system using a transmission x-ray source
12/153,001 (US) – High throughput 3D x-ray imaging system using a transmission x-ray source
I890901 (Taiwan) – High throughput 3D x-ray imaging system using a transmission x-ray source
7,626,856/JPB007626856 (Japan) – High throughput 3D x-ray imaging system using a transmission x-ray source
11/992,350 (USA) – System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector

AttoMap

10/658,145 B2 (US) – High brightness x-ray reflection source
10/991,538 (US) – High brightness x-ray reflection source
ZL 201980049306.7 (US) – High brightness x-ray reflection source
GB2591630B (UK) – High brightness x-ray reflection source
JP 7117452 (Japan) – High brightness x-ray reflection source
11/056,308 (US) – System and Method for Depth-selectable X-ray Analysis
ZL 201980065789.9 (China) – System and Method for Depth-selectable X-ray Analysis
11/143,605 (US) – System and method for computed laminography x-ray fluorescence imaging
ZL 201980047763.2 (China) – System and method for computed laminography x-ray fluorescence imaging
JP 7182749 (Japan) – System and method for computed laminography x-ray fluorescence imaging
12/278,080 (USA) – Microfocus x-ray source for generating high flux low energy x-rays
12,360,067 (USA) – X-ray fluorescence system and x-ray source with electrically insulative target material
12/429,436 (USA) – X-ray analysis system with focused x-ray beam and non x-ray microscope

EclipseXRM

10/658,145 B2 (USA) – High brightness x-ray reflection source
10/991,538 (USA) – High brightness x-ray reflection source
ZL 201980049306.7 (China) – High brightness x-ray reflection source
GB2591630B (UK) High brightness x-ray reflection source
JP 7117452 (Japan) – High brightness x-ray reflection source
12/181,423 (USA) – Secondary image removal using high resolution x-ray transmission sources 

Quantum Leap

10/658,145 B2 (USA) – High brightness x-ray reflection source
Europe 3152554 (Europe) – X-ray absorption measurement system
EP 3152554 (Europe) – X-ray absorption measurement system
10/976,273 B2 (USA) – X-ray transmission spectrometer system
ZL 201880025128.X (China) – Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
EP 3602020 (Europe) – Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
10/416,099 (USA) – Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
JP 6937380 (Japan) – Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
10/578,566 (USA) – X-ray Emission Spectrometer System
10/991,538 (USA) – High brightness x-ray reflection source
ZL 201980049306.7 (China) – High brightness x-ray reflection source
GB2591630B (UK) – High brightness x-ray reflection source
JP 7117452 (Japan) – High brightness x-ray reflection source
JP 7195341 (Japan) – Wavelength dispersive x-ray spectrometer
11/215,572 (USA) – System and method for x-ray absorption spectroscopy using a crystal analyzer and a plurality of detector elements
11/428,651 (USA) – System and Method for X-ray Absorption Spectroscopy using a Crystal Analyzer and a Plurality of Detector Elements
ZL 202180036021.7 (China) – System and Method for X-ray Absorption Spectroscopy using a Crystal Analyzer and a Plurality of Detector Elements
JP 7395775 (Japan) – System and Method for X-ray Absorption Spectroscopy using a Crystal Analyzer and a Plurality of Detector Elements
12/209,977 (USA) – X-ray detector system with at least two stacked flat Bragg diffractors
12/429,437 (USA) – System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes

XADA

10/991,538 (USA) – High brightness x-ray reflection source
ZL 201980049306.7 (China) – High brightness x-ray reflection source
GB2591630B (UK) – High brightness x-ray reflection source
JP 7117452 (Japan) – High brightness x-ray reflection source
Germany Letters Patent No. 11 2019 003 777.3 – High brightness x-ray reflection source
12/429,436 (USA) – X-ray analysis system with focused x-ray beam and non x-ray microscope
12/431,256 (USA) – System and method for generating a focused x-ray beam